Electronic Chemicals G4 Hydrochloric Acid

G4 Hydrochloric Acid yog siab -purity inorganic acid tshwj xeeb purified rau semiconductor wafer fabrication thiab advanced microelectronics manufacturing. Ua los ntawm ultra-purification, tsawg- paug pom thiab huv si-chav filling txheej txheem, cov khoom no nta ultra- tsis tshua muaj kab hlau ions, anionic impurities thiab micro-particles, tag nrho ua raws li SEMI G4 kev lag luam specifications.

Nws yog cov tshuaj ntub dej tseem ceeb rau semiconductor pem hauv ntej- cov txheej txheem kawg, tshem tawm cov khoom siv hlau tsis zoo, ionic residues thiab oxide impurities ntawm wafer nto. Kev tswj hwm impurity nruj tshem tawm cov micro- muaj kev pheej hmoo kis kab mob, ua kom muaj txiaj ntsig zoo thiab kev ua haujlwm ruaj khov rau cov txheej txheem tsim chip siab heev.

Qhov tsos:Tsis muaj xim, pob tshab thiab ntshiab kua nrog me ntsis pungent tsw

Nco tseg:Tag nrho cov ntaub ntawv xeem yog raws li batch- tshwj xeeb COA (Certificate of Analysis).

Wafer Surface Cleaning:Tshem tawm cov hlau ions residual, inorganic contaminants thiab nto oxide txheej ntawm silicon wafers, txhim kho wafer nto huv si rau tom ntej etching thiab deposition txheej txheem.

Semiconductor ntub dej Etching:Siv rau precision micro-etching ntawm silicon-raws li cov ntaub ntawv thiab compound semiconductor substrates nrog ruaj khov etching npaum li cas thiab cov nyhuv zoo ib yam.

Txheej Txheem Kev Npaj:Tsim cov kev sib xyaw ua kom huv thiab etching cov kev daws teeb meem rau RCA cov txheej txheem tu, sib piv cov khoom siv semiconductor pem hauv ntej- kawg kev tsim khoom.

Advanced Ntim & MEMS txheej txheem:Kev kho deg thiab tshem tawm impurity rau MEMS li, nti ntim thiab microelectronic tivthaiv ua.

Ntim Hom:Clean-qib HDPE kaw nruas / IBC huv tote

Common Specification:25kg / 30kg me nruas, 1000kg IBC tote

Filling Ib puag ncig:Chav kawm 1000 huv chav, xoom theem ob kis kab mob, nruj me ntsis tswj particle thiab impurity qhia

Sealing Standard:Professional acid-resistant ntim ntim, tiv thaiv-volatilization thiab tiv thaiv- leakage

● Khaws rau hauv qhov chaw txias, qhuav, qhov cua thiab cov khoom siv tshuaj lom neeg, khaws cia kom nruj, kom deb ntawm tshav ntuj ncaj qha, qhov kub thiab txias.

● Cais tawm ntawm cov tshuaj alkaline, oxidants thiab cov tshuaj organic kom tsis txhob muaj tshuaj lom neeg thiab kev sib kis.

● Ua nruj ua tsiv kom tsis txhob ntev - qhib qhov chaw los tiv thaiv qhov tsis zoo ntawm qhov tsis zoo thiab nqus dej tsis huv.

● Txee Lub neej: 12 lub hlis raws li cov txheej txheem kaw cia

● Hydrochloric acid yog corrosive thiab volatile. Cov neeg ua haujlwm yuav tsum hnav PPE ua tiav: cov kua qaub- cov hnab looj tes tiv thaiv, tsom iav tshuaj, corrosion- tiv thaiv apron thiab khaub ncaws tiv thaiv.

● Ua haujlwm hauv qhov chaw cua; zam kev nqus pa ntawm cov pa tsis haum thiab tiv thaiv ncaj qha rau ntawm daim tawv nqaij thiab qhov muag.

● Dilution lag luam: maj mam ntxiv cov kua qaub rau hauv dej, tsis txhob ntxiv dej rau hauv cov concentrated hydrochloric acid kom tsis txhob txaws thiab raug mob.

● Thaum muaj kev sib cuag lossis xau, ua raws li SDS cov lus qhia thaum muaj xwm ceev rau kev tu thiab pov tseg raws sij hawm.

● Rau kev faib cov phom sij tag nrho, cov cai ntawm kev thauj mus los thiab thawj - kev ntsuas kev pab, xa mus rau daim ntawv SDS official.

Txhua pawg ntawm G4 Hydrochloric Acid yog tsim thiab tshuaj xyuas raws li SEMI G4 thoob ntiaj teb cov qauv. Txhua qhov khoom xa tuaj yog nrog rau kev ua haujlwm batch COA. Tag nrho cov txheej txheem tsim khoom, kev ua kom huv thiab sau cov txheej txheem tau txais kev huv huv huv -chaw tswj kev sib kis kom ntseeg tau tias cov khoom lag luam ruaj khov thiab zoo ib yam rau siab -kawg semiconductor manufacturing applications.

Cim npe nrov: Tuam Tshoj G4 Hydrochloric Acid Manufacturers thiab lwm tus neeg - Factory Price