Electronic Chemical G4 Nitric Acid (Semiconductor Wet Chemical)

Electronic Chemical G4 Nitric Acid (Semiconductor Wet Chemical)

Cov ntaub ntawv kho dua: 01
Hnub tim: 2026-09-02
Cov qauv siv tau: SEMI G4 Qib (Semiconductor Ultra-High Purity Wet Chemical)

Kev txheeb xyuas cov khoom

 

Yam khoom

Specification

Khoom npe

G4 Nitric acid

Yam khoom

Semiconductor Electronic Wet Chemical

Tshuaj npe

Nitric Acid

Tshuaj Formula

HNO ₃

CAS Nr.

7697-37-2

Molecular Luj

63.01

UN Number

2031

Qib

SEMI G4 Ultra-High Purity Electronic Qib

 

Product Overview

 

G4 Nitric Acid yog siab -purity muaj zog oxidizing inorganic acid tshwj xeeb uas tsim los rau semiconductor wafer manufacturing thiab advanced microelectronics txheej txheem. Tsim los ntawm multi-theem distillation, ultra-kev ua kom huv si zoo thiab Chav Kawm 1000 huv-chav ntim cov txheej txheem, cov khoom no nruj me ntsis tswj cov kab hlau ions, anionic impurities thiab cov khoom hauv huab cua, ua raws li SEMI G4 thoob ntiaj teb semiconductor qauv.

 

Nws ua haujlwm ua cov tshuaj ntub dej tseem ceeb rau semiconductor pem hauv ntej- kawg tu thiab hlau etching. Nrog muaj zog oxidizing thiab tu muaj peev xwm, nws zoo tshem tawm cov kab mob hlau, cov organic residues thiab deg micro- tsis xws luag ntawm silicon wafers. Ultra- cov ntsiab lus tsis muaj impurity tsawg tshem tawm cov txheej txheem kev kis kab mob, ua kom ruaj khov wafer nto zoo thiab txhim kho cov khoom tsim tawm rau kev tsim cov chips siab heev.

 

Qhov tsos:Tsis muaj xim los yog daj daj me ntsis pob tshab volatile kua

 

Technical Specifications (SEMI G4 Standard)

 

Cov khoom kuaj

Specification

HNO ₃ Assay

69.0 ~ 71.0 hli

Qhov tshwm sim

Tsis muaj xim los yog daj ntseg daj ntshiab pob tshab kua

Xim (APHA)

Tsawg dua los yog sib npaug li 10

Ceev @ 20 degree

1.40 ~ 1.42 g / cm³

evaporation residue

Tsawg dua lossis sib npaug li 50 ppb

Ib tus neeg taug qab hlau (Na, K, Ca, Mg, Fe, Cu, Al, Zn, Ni, Cr)

Tsawg dua lossis sib npaug li 10 ppb txhua

Sulfate (SO₄²⁻)

Tsawg dua lossis sib npaug li 50 ppb

Chloride (Cl⁻)

Tsawg dua los yog sib npaug li 30 ppb

Phosphate (PO₄³⁻)

Tsawg dua los yog sib npaug li 30 ppb

Cov khoom loj dua lossis sib npaug ntawm 0.2μm

Tsawg dua lossis sib npaug li 100 pcs / mL

 

Nco tseg:Tag nrho cov ntaub ntawv xeem yog raws li batch- tshwj xeeb COA (Certificate of Analysis).

 

Daim Ntawv Thov (Semiconductor Wet Process)

 

Wafer Heavy Hlau Ntxuav:Tshem tawm cov khoom hnyav hlau xws li hlau, tooj liab, zinc thiab residual inorganic impurities ntawm silicon wafer nto. Nws cov cuab yeej oxidizing muaj zog ua kom huv huv yam tsis muaj kev qhia txog kev kis kab mob thib ob, ua tau raws li ultra- kev ua kom huv huv siab rau cov txheej txheem wafer siab heev.

 

Hlau Thin Film Etching:Siv rau kev zoo etching thiab tshem tawm ntawm ntau yam hlau nyias zaj duab xis nyob rau hauv semiconductor manufacturing, nrog ruaj khov etching tus nqi thiab zoo heev uniformity, haum rau precision qauv ua ntawm microelectronic li.

 

Compound Wet Cleaning Solution Formulation:Siv los npaj tov kua qaub ntxuav cov kev daws teeb meem rau semiconductor RCA txheej txheem ntxuav, koom tes nrog lwm cov tshuaj hluav taws xob kom tshem tawm cov organic residues, hais thiab ionic impurities comprehensively.

 

MEMS thiab Advanced Ntim Kev Kho Mob:Tsim nyog rau kev ntxuav saum npoo, tshem tawm impurity thiab micro-etching ntawm MEMS li, semiconductor sensors thiab nti ntim khoom, yoog mus rau siab -precision microelectronic manufacturing qauv.

 

Ntim & Filling Standard

 

Ntim Hom:Clean-qib corrosion-resistant HDPE kaw nruas, mob siab rau nitric acid tshuaj ntim

Common Specification:25kg / 30kg me nruas, 1000kg corrosion-resistant IBC tote

Filling Ib puag ncig:Chav kawm 1000 huv chav, kaw ultra- ntshiab filling system, nruj me ntsis tshem tawm cov kab mob hauv nruab nrab thiab impurity paug

Sealing Standard:Anti-oxidation, tiv thaiv-volatile thiab leak- pov thawj kaw qauv, tiv thaiv cov khoom tsis zoo thiab cov pa phem sab nraud

 

Cia & Txee Lub neej

 

● Khaws rau hauv qhov chaw txias, qhuav, qhov cua thiab mob siab rau corrosive warehouse, khaws kom nruj, kom deb ntawm tshav ntuj ncaj qha, qhov kub thiab txias kom tsis txhob thermal decomposition.

● Kev cais tawm nruj me ntsis ntawm cov khoom siv hluav taws xob, txo cov neeg ua haujlwm, cov tshuaj alkaline thiab cov khoom siv organic los tiv thaiv kev ua phem oxidation thiab kev nyab xeeb.

● Zam kom tsis txhob muaj lub teeb pom kev ntev ntev los tiv thaiv kev tsis muaj xim thiab purity poob los ntawm photolysis.

● Lub neej txee:12 lub hlis nyob rau hauv cov txheej txheem kaw thiab tsaus nti cia

 

Kev tuav & kev tiv thaiv kev nyab xeeb

 

● Nitric acid muaj zog corrosive thiab oxidizing nrog volatility. Cov neeg ua haujlwm yuav tsum hnav PPE ua tiav: cov kua qaub- cov hnab looj tes tiv thaiv, cov looj tsom iav uas muaj tshuaj tiv thaiv, corrosion- tiv thaiv apron thiab tiv thaiv cov khaub ncaws ua haujlwm.

● Tag nrho cov tuav, dilution thiab dosing kev khiav hauj lwm yuav tsum tau ua nyob rau hauv lub fume hood muaj ntawv pov thawj; zam kev nqus pa ntawm cov pa phem tsis zoo thiab tiv tauj ncaj qha rau ntawm daim tawv nqaij, qhov muag thiab cov mucous membranes.

● Thaum dilution, maj mam ntxiv nitric acid rau hauv dej deionized; Tsis txhob nchuav dej rau hauv cov concentrated nitric acid kom tiv thaiv cov kua txaws thiab tshuaj kub hnyiab.

● Nyob rau hauv rooj plaub ntawm kev sib chwv tsis sib haum, spillage los yog to, siv pov tseg thaum muaj xwm ceev tam sim ntawd raws li cov txheej txheem kev khiav hauj lwm thiab SDS cov lus qhia.

● Xa mus rau cov ntaub ntawv SDS txoj cai rau tag nrho cov kev faib phom sij, cov cai thauj mus los thiab cov ncauj lus kom ntxaws ua ntej - kev pab cuam.

 

Quality Assurance

 

Txhua batch ntawm G4 Nitric Acid yog tsim, purified thiab soj ntsuam nruj raws li SEMI G4 thoob ntiaj teb semiconductor kev lag luam specifications. Txhua qhov khoom xa tuaj yog nrog los ntawm ib pawg - tshwj xeeb COA. Tag nrho cov txheej txheem tsim khoom thiab sau cov txheej txheem tau txais kev huv huv huv -chav tswj kev sib kis thiab oxidation- tiv thaiv kev tswj hwm, kom ntseeg tau tias ultra- siab purity, tsis tshua muaj impurity thiab ruaj khov batch sib xws, siab txaus siab cov kev cai nruj heev ntawm cov txheej txheem semiconductor ntub.

 

Cim npe nrov: g4 nitric acid (semiconductor ntub tshuaj), Tuam Tshoj hluav taws xob tshuaj g4 nitric acid (semiconductor ntub tshuaj) manufacturers, lwm tus neeg, Hoobkas

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