Electronic Chemicals G4 Phosphoric Acid (Semiconductor Wet Chemical)

G4 Phosphoric Acid yog ib qho ultra- siab- purity tsis muaj zog inorganic acid tshwj xeeb ua kom zoo rau cov khoom siv hluav taws xob siab tshaj plaws thiab kev tsim khoom microelectronics. Ua los ntawm ntau-theem purification, ultra-fine filtration thiab Class 1000 huv-chav kaw cov txheej txheem, cov khoom nta tsis tshua muaj kab hlau ions, anionic impurities thiab micro-particles, tag nrho raws li nruj SEMI G4 thoob ntiaj teb semiconductor qauv.

Cov tshuaj no muaj cov kev xaiv zoo tshaj plaws rau kev ua haujlwm zoo rau silicon nitride, aluminium nyias zaj duab xis thiab cov khoom siv tshwj xeeb dielectric, nrog kev ruaj khov etching tus nqi thiab cov txheej txheem zoo dua. Nws ua rau muaj kev puas tsuaj tsawg kawg nkaus rau silicon substrates thiab oxide txheej, tshem tawm cov khoom seem seem ntawm qhov chaw thiab ua tau raws li kev ua kom huv huv siab rau cov txheej txheem wafer siab heev. Kev tswj hwm impurity nruj tshem tawm cov micro- cov kev pheej hmoo tsis raug, ua kom muaj txiaj ntsig zoo thiab kev ua haujlwm ruaj khov rau siab -kev tsim khoom semiconductor.

Qhov tsos:Tsis muaj xim, pob tshab, syrupy viscous kua, ntxhiab tsw

Nco tseg:Tag nrho cov ntaub ntawv xeem yog raws li batch- tshwj xeeb COA (Certificate of Analysis).

Silicon Nitride & Aluminium Zaj duab xis Etching:Core ntub etching tshuaj rau semiconductor pem hauv ntej- kawg txheej txheem, siv rau precision etching ntawm Si₃N₄ nyias zaj duab xis, txhuas hlau rooj vag thiab txhuas pad txheej. Nws nta zoo heev etching selectivity, zoo tiv thaiv silicon oxide thiab silicon substrate thaum ua kom zoo ib yam thiab ruaj khov etching morphology.

Wafer Surface Precision Ntxuav:Tshem tawm cov micro-particles, residual inorganic impurities thiab nto kab kab mob uas tsim tawm thaum lub sij hawm etching thiab deposition txheej txheem. Tsawg- tus yam ntxwv ion tsis txhob muaj kuab paug thib ob, tswj hwm ultra- kev huv huv ntawm wafers rau cov txheej txheem lithography thiab kev tso nyiaj siab.

Compound Wet Solution Formulation:Siv rau kev npaj siab -purity sib xyaw etching thiab ntxuav cov kev daws teeb meem rau cov txheej txheem tshwj xeeb semiconductor, sib piv siab -precision micro-nano tsim cov kev cai ntawm kev sib koom ua ke.

MEMS & Advanced Semiconductor Ntim:Siv rau micro-etching thiab kev kho saum npoo ntawm MEMS li, micro-sensors thiab cov txheej txheem ntim ntim siab heev, kom ntseeg tau meej cov qauv txhais thiab kev ua haujlwm ruaj khov.

Ntim Hom:Clean-qib corrosion-resistant HDPE kaw nruas, siab siab -purity phosphoric acid ntim

Common Specification:25kg / 30kg me nruas, 1000kg corrosion-resistant IBC tote

Filling Ib puag ncig:Chav kawm 1000 huv si, tag nrho kaw ultra- ntshiab filling system, nruj me ntsis tswj particle thiab impurity introduction kom tsis txhob muaj lwm yam kab mob.

Sealing Standard:High-tightness leak- pov thawj kaw qauv, tiv thaiv - pa phem thiab tiv thaiv - deterioration, kom ntseeg tau ntev - lub sij hawm purity stability

● Khaws rau hauv qhov chaw txias, qhuav, cua txias rau cov khoom siv tshuaj lom neeg, khaws cia kom nruj, kom deb ntawm tshav ntuj ncaj qha, qhov kub thiab txias.

● Cais tawm ntawm cov tshuaj alkaline, muaj zog oxidants, hlau hmoov thiab corrosive incompatible ntaub ntawv los tiv thaiv cov tshuaj tiv thaiv thiab purity degradation.

● Tsis txhob ncua ntev - qhib qhov chaw thiab kev nqus dej kom tsis txhob muaj impurity enrichment thiab kev ua haujlwm hloov.

● Lub neej txee:12 lub hlis nyob rau hauv cov txheej txheem kaw cia

● Phosphoric acid yog nruab nrab corrosive thiab hygroscopic. Cov neeg ua haujlwm yuav tsum hnav cov qauv ua tiav PPE: cov kua qaub- cov hnab looj tes tiv thaiv, tsom iav tiv thaiv tshuaj lom neeg, corrosion- tiv thaiv apron thiab tiv thaiv cov khaub ncaws ua haujlwm.

● Tag nrho cov dilution, sampling thiab tuav kev khiav hauj lwm yuav tsum tau ua nyob rau hauv ib tug kws fume hood kom tsis txhob nqus pa ntawm huab cua thiab ncaj qha mus rau daim tawv nqaij thiab mucous daim nyias nyias.

● Thaum lub sij hawm dilution, maj mam ntxiv phosphoric acid rau hauv dej deionized; Tsis txhob ntxiv dej rau hauv cov ntsiab lus phosphoric acid kom tiv thaiv kev sib tsoo thiab tshuaj lom neeg raug mob.

● Nyob rau hauv cov ntaub ntawv ntawm cov kua splashing, daim tawv nqaij sib cuag los yog to, ua thaum muaj xwm ceev tu thiab pov tseg tam sim ntawd raws li tus txheej txheem kev khiav hauj lwm cov txheej txheem.

● Xa mus rau cov ntaub ntawv SDS official rau cov ntaub ntawv muaj kev phom sij, cov kev cai thauj mus los thiab cov ncauj lus kom ntxaws ua ntej - kev pab cuam.

Txhua batch ntawm G4 Phosphoric Acid yog tsim, purified thiab soj ntsuam nruj raws li SEMI G4 thoob ntiaj teb semiconductor qauv kev lag luam. Txhua qhov khoom xa tuaj yog nruab nrog ib pawg - tshwj xeeb COA. Tag nrho cov txheej txheem tsim khoom thiab sau cov txheej txheem tau txais kev huv huv huv -chav tswj kev sib kis thiab siab - kev tswj hwm kev huv, kom ntseeg tau tias ultra- tsis muaj impurities, ruaj khov batch sib xws thiab cov txheej txheem siab hloov tau, ua tau raws li cov txheej txheem ntub dej nruj heev ntawm kev tsim khoom semiconductor siab heev.

Cim npe nrov: g4 phosphoric acid (semiconductor ntub tshuaj), Tuam Tshoj hluav taws xob tshuaj g4 phosphoric acid (semiconductor ntub tshuaj) manufacturers, lwm tus neeg, Hoobkas